Tag Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a thin film deposition technique used in nanotechnology and semiconductor manufacturing. It involves sequentially depositing atomic layers of different materials onto a substrate, ensuring precise and conformal coatings with excellent thickness control.

Surface Treatment

Advancing Surface Engineering: Vacuum Coating

Table of Contents What is a vacuum coating? Basic Principles Vacuum Environment Evaporation Sputtering Ion Plating Chemical Vapor Deposition (CVD) Types of Vacuum Coating Technology Physical Vapor Deposition (PVD) Coatings Chemical Vapor Deposition (CVD) Coatings Magnetron Sputtering Atomic Layer Deposition…

Capable Machining
05/06
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